Soft X-Rays and Extreme Ultraviolet Radiation: Principles...

Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications

David Attwood
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This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science.
"This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy."--BOOK JACKET. "The book will be of interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science."--BOOK JACKET.  Read more...
Ch. 1. Introduction --
Ch. 2. Radiation and Scattering at EUV and Soft X-Ray Wavelengths --
Ch. 3. Wave Propagation and Refractive Index at EUV and Soft X-Ray Wavelengths --
Ch. 4. Multilayer Interference Coatings --
Ch. 5. Synchrotron Radiation --
Ch. 6. Physics of Hot Dense Plasmas --
Ch. 7. Extreme Ultraviolet and Soft X-Ray Lasers --
Ch. 8. Coherence at Short Wavelengths --
Ch. 9. Soft X-Ray Microscopy with Diffractive Optics --
Ch. 10. Extreme Ultraviolet and X-Ray Lithography
Kategorije:
Godina:
1999
Izdavač:
Cambridge University Press
Jezik:
english
Strane:
486
ISBN 10:
0521652146
ISBN 13:
9780521652148
Fajl:
PDF, 17.96 MB
IPFS:
CID , CID Blake2b
english, 1999
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